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  • Persian

A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS

Document Type : Research Note

Authors

  • M. Moulavi kakhaki
  • H. Salari

School of Engineering, Department of Electrical - University of Mashhad

Abstract

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Keywords

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Sharif Journal of Mechanical Engineering
Volume 21, No.30
Science & Engineering
May 2005
Pages 65-75

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APA

Moulavi kakhaki, M. and Salari, H. (2005). A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS. Sharif Journal of Mechanical Engineering, 21(No.30), 65-75.

MLA

Moulavi kakhaki, M. , and Salari, H. . "A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS", Sharif Journal of Mechanical Engineering, 21, No.30, 2005, 65-75.

HARVARD

Moulavi kakhaki, M., Salari, H. (2005). 'A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS', Sharif Journal of Mechanical Engineering, 21(No.30), pp. 65-75.

CHICAGO

M. Moulavi kakhaki and H. Salari, "A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS," Sharif Journal of Mechanical Engineering, 21 No.30 (2005): 65-75,

VANCOUVER

Moulavi kakhaki, M., Salari, H. A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS. Sharif Journal of Mechanical Engineering, 2005; 21(No.30): 65-75.

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